Strain-Engineered MOSFETs

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Strain-Engineered MOSFETs

Strain-Engineered MOSFETs by C.K. Maiti
English | 9 Nov. 2012 | ISBN: 1466500557 | 311 Pages | PDF | 11 MB

Currently strain engineering is the main technique used to enhance the performance of advanced silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs).
Written from an engineering application standpoint, introduces promising strain techniques to fabricate strain-engineered MOSFETs and to methods to assess the applications of these techniques.

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Tags: Strain, MOSFETs

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